The Plasmonic Influence on the Performance of Laser-Scribed Front-Contact Gold Layer in Ultra-Thin Film SiliconSolar Cell

Abstract

Laser scribing of the front-layer metal contact in thin-film silicon solar cell is one method that
enhances optical absorption through localized surface plasmon resonance (LSPR) induced at the laser-scribed
gold nano-grooves. A new approach investigates both the plasmonic effect and increasing the absorption of the
gold via laser scribing to improve the cell performance. A 3D ultra- thin film silicon solar cell (dimensions of
400 × 400 × 900 nm3 for width, length, and height) was designed, with a 50 nm thick gold front contact scribed
at groove depths of 10, 20, 30, and 40 nm (fixed width of 100 nm). COMSOL Multiphysics software version
6.2, using the finite element method (FEM), was employed to design and numerically investigate the proposed
cell. The results revealed a maximum photocurrent of 24.66 mA/cm2 at a scribed depth of 40 nm. The laserscribed
nano-grooves excite localized surface plasmon resonances at the gold-silicon interface, enhancing
electromagnetic field confinement and light trapping in the ultra-thin silicon layer. It is concluded that the laser
scribing of the front gold contact improves the light absorption, leading to a significant increase in photogeneration
rate and photocurrent density due to plasmonic field enhancement.